【Research Theme】
Kenjiro Kimura
Kobe University, Department of Chemistry, Lecturer
http://www.edu.kobe-u.ac.jp/sci-onishi/index-E.html
Among extreme miniaturization technologies, the development of a high-throughput electron beam lithography method is one of most important work. The conventional "one stroke writing electron beam lithography method" needs considerable time and costs, and can’t be utilized for the mass-production and integration of nano-scale systems and devices. Therefore, in this study, we develop a high-throughput electron beam lithography apparatus for the mass-production, which makes the best use of “extremely small wavelength of electron beam” and “its good orbital controllability”.
