KURODA Solid Surface


Research Director: Dr. Haruo Kuroda
(Professor, Faculty of Science, The University of Tokyo)
Research Term: 1985-1990


This project investigated various chemical processes to modify silicon surfaces and to fabricate organic multi-layers using reactions with surface functional groups. Both chemical and photochemical processes were exploited in order to attach metal clusters to silica surfaces as well as to the surfaces of silicon single-crystals. This effort was aimed at establishing fabricating methods for specified metal clusters on surfaces. Investigations were also carried out on the formation of new material systems, such as bimetallic artificial superlattices, using molecular beam epitaxy.

Research Results

New detector for SEXAFS: A small UHV-compatible x-ray detector was developed for soft-x-ray spectroscopy using synchrotron radiation. This device has greatly expanded the possibilities of applying both surface EXAFS and soft-x-ray standing-wave techniques to investigations of adsorbed layer structures on surfaces. The structures of S and Cl layers adsorbed on metal single crystal surfaces were extensively investigated using these techniques.

Superlattices with unique magnetic properties: Bimetallic artificial superlattices (Eu/Mn, Eu/Yb, Sm/Yb and Dy/Yb) were synthesized using MBE. It was also found that rare-earth metal layers with structures that are normally unstable could be grown by utilizing the epitaxial relation with the substrate.

Photochemical grafting of metal clusters: It was found that a variety of new types of metal clusters can be selectively fixed on a silica surface by utilizing photochemical processes.

Hydrogen passivation of a silicon surface: A new method called “UV/HF cleaning” was developed for obtaining passivated clean silicon surfaces. On a silicon (100) surface treated by this technique dangling bonds were found to be completely terminated with hydrogen.

Chemical modification of silicon surface: A new method was developed for terminating the dangling bonds on a silicon surface using fluorine atoms. The Si-F bonds on a thus-fluorinated surface were found to be completely converted to Si-OH bonds, producing an OH-covered surface when treated with ultra-pure water.

New molecular beam source for organic MBE: A special type of K-cell was developed for depositing an organic material using a molecular beam technique under UHV conditions.


·The surface structure of a clean Si (100) single crystal created by the HF treatment coupled withUV irradiation


·Anomalous Magnetic Characteristics Observed in Amorphous Eu/Mn Superrlattices

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