[Takeo Ohno] Resistive Memory with an Ultra-thin Nanometer-thick Metal Oxide

Presto Researcher

Takeo Ohno

WPI-Advanced Institute for Materials Research, Tohoku University
Associate Professor

Research Outline

By means of oxygen neutral beam, ion and atom-controlled resistive switching memory with an ultra-thin nanometer-thick metal oxide film is fabricated. This study is aimed at the demonstration of switching operation with low power consumption of 0.1 pJ, low threshold voltage of 0.1 V and high speed switching time of 0.1 ns.

Quick Access

Program

  • CREST
  • PRESTO
  • ACT-I
  • ERATO
  • ACT-X
  • ACCEL
  • ALCA
  • RISTEX
  • AIP Network Lab
  • Global Activities
  • Diversity
  • SDGs
  • OSpolicy
  • Yuugu
  • Questions