Brochure PDF

Research Director

Hiroshi Fujioka

(Professor, Institute of Industrial Science, The University of Tokyo)

1984　B.S., The University of Tokyo
1984　Engineer, Fujitsu Limited
1995　Ph.D., University of California at Berkeley
1995　Research Associate, University of California at Berkeley
1996　Research Associate, The University of Tokyo
1998　Assistant Professor, The University of Tokyo
1999　Associate Professor, The University of Tokyo
2004　Professor, Institute of Industrial Science, The University of Tokyo

Program Manager

Akira Usui

(ACCEL Program Manager, Japan Science and Technology Agency)

1970　BA in Chemical Engineering, Tohoku University
1970　NEC Corporation
1997　Ph.D. University of Tsukuba
2002　Furukawa Company Ltd.
2016　ACCEL Program Manager, JST

Outline of R&D Project

Under the previous CREST project, we developed a new low temperature growth technique for high quality nitride semiconductors called PSD.*１）The use of PSD allows us to fabricate various nitride semiconductor devices on large-area substrates that cannot survive high temperature processing. In fact, we succeeded in fabrication RGB full color LEDs on amorphous substrate with the use of this technique.
In this ACCEL project, we will integrate a LED array with its driving circuits based on the nitride semiconductors on a flexible substrate to demonstrate feasibility of our technique for display applications.

*1) PSD (Pulsed Sputtering Deposition):
A kind of sputtering thin film deposition method which offers high quality epitaxial films even at low substrate temperatures