[Kosuke Nagashio] Gap states analysis for bilayer graphene and their reduction by multi-layered gate stack structure

Presto Researcher

Kosuke Nagashio
School of Engineering, The University of Tokyo
Associate Professor
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Outline

Based on the comparison with the interface states in SiO2/Si system, the critical issue on gap states in layered materials, especially, bilayer graphene, are investigated systematically by applying many kinds of analysis techniques. The research objectives are to understand the origin for the gap states by comparing many kinds of gate stack structures and to provide the guideline to reduce the gap states. Final goal is to achieve both high mobility and high on-off ratio for on-current.

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