HOME > Research Areas by Category > Research of Innovative... > Development of Ultra-Fine...

Development of Ultra-Fine Structure Metrology System using Coherent EUV Source

Research Project Outline

A new metrology system has been developed that is based on X-ray diffraction microscopy in the EUV region and is ca-pable of measuring CD value and inspecting pattern defects with a high accuracy. The integration of a coherent EUV source employing a high-harmonic laser system and EUV scattero-metric microscopy has enabled the construction of a practical system for CD measurement and the inspection pattern defects with subnanometer accuracy.

Research Director
Professor, University of Hyogo
Research Started
Research Area
Research of Innovative Material and Process for Creation of Next-generation Electronics Devices
Research Areas by Category
Research Areas Completed
Researcher Index