HOME > Research Areas by Category > Research of Innovative... > Study on Resist Materials for...

Study on Resist Materials for Nanofabrication and Development of Process Simulator

Research Project Outline

Ionizing radiation (EUV, EB etc) is a key technology for future nanofabrication because it can deposit their energy on nanoscale region without any difficulty. Our purpose is the establishment of scientific foundation for the application of ionizing radiation to nanofabrication on industrial scale. We clarify reaction mechanisms induced in resist materials for nanofabrication by ionizing radiation. The knowledge on reaction mechanisms are applied to resist and process designs. We develop a process simulator based on reaction mechanisms.

Research Director
Specially Appointed Professor, Osaka University
Research Started
Research Area
Research of Innovative Material and Process for Creation of Next-generation Electronics Devices
Research Areas by Category
Research Areas Completed
Researcher Index