Three-dimensional Carbon Active Interconnects for LSI

Research Project Outline

This research project focused on the development of graphene interconnect technologies to solve reliability and performance issues of LSI interconnects. We succeeded in growing multi-layer graphene, by using our original photoemission-assisted plasma-enhanced CVD method, on dielectrics without metal catalyst films.

Research Director
MizuhisaNihei
Affiliation
Fujitsu Limited
Research Started
2007
Status
completed
Research Area
Research of Innovative Material and Process for Creation of Next-generation Electronics Devices
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