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Associate Professor, Research Institute for Electronic Science, Hokkaido University |
http://kueno.com/ |
Development of Fabrication Technology of Metal Nanopatterns by Nano-Lithography |
Nano-lithography whose resolution is less than 10 nm will be developed and employed to fabricate metal nanostructures worked as plasmonic devices and electric circuits. This technology developed in this study is based on different principles from an original lithographic technique since nanopatterns of photoresist will be formed by a local photoreaction utilizing plasmonic electromagnetic field enhancement induced at nanogaps of metal nanostructures. |
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