研究者

1期生紹介

1期生2期生3期生

静電エネルギーの発散を利用した人工界面相の創成と制御
Hwang Harold 写真
Harold Y. Hwang
生年:1970年
出身:California
 

学歴 - EDUCATION

June 1997 Ph.D. in Physics, Princeton University.
January 1993 M.S. and B.S. in Electrical Engineering, Massachusetts Institute of Technology.
January 1993 B.S. in Physics, Massachusetts Institute of Technology.

職歴 - POSITIONS

2010-present Team Leader, Correlated Electron Research Group, RIKEN Advanced Science Institute, Wako, Japan.
2010-present Professor, Department of Applied Physics and SLAC Photon Science, Stanford University, Stanford, CA.
2009-2010 Professor, Department of Advanced Materials Science & Department of Applied Physics, University of Tokyo, Kashiwa, Japan.
2006-2007 Visiting Associate Professor, Institute for Chemical Research, Kyoto University, Kyoto, Japan
2003-2008 Associate Professor, Department of Advanced Materials Science & Department of Applied Physics, University of Tokyo, Kashiwa, Japan.
1996-2003 Member of Technical Staff, Materials Physics Research, Bell Laboratories, Lucent Technologies, Murray Hill, NJ.
1995-1996 Research Assistant, Materials Physics Research, Bell Laboratories, AT&T/Lucent Technologies, Murray Hill, NJ.
1994 Research Assistant, Biological Computation Research, AT&T Bell Laboratories, Murray Hill, NJ.
1990-1993 Research Assistant, Solid State and Physics of Materials Research, AT&T Bell Laboratories, Murray Hill, NJ.
1987-1989 Research Assistant, Department of Pharmacology, University of Texas Southwestern Medical Center, Dallas, TX.

Website
http://www.stanford.edu/group/hyhwang/

  • 1期生: 2006年~2009年
  • 2期生: 2007年~2010年
  • 3期生: 2008年~2011年