ImPACT Program Manager Masashi Sahashi

The 3rd ImPACT International Symposium on Spintronic Memory,Circuit and Storage

ImPACT Sahashi Program Report on The 3rd 【ImPACT】 International Symposium

Meeting Name The 3rd 【ImPACT】 International Symposium on Spintronic Memory, Circuit and Storage
Date September 23 - 25, 2017
Venue Aobayama Campus, Tohoku University
Session Room Qatar Science Campus Hall
Discussion and Poster Session Room
with Welcome Reception
DOCK (1F)
Dr. Yuko Harayama(CSTI)
 Dr. Yuko Harayama(CSTI)
Prof. Susumu Satomi (Tohoku Univ.)
Prof. Susumu Satomi
(Tohoku Univ.)
Dr. Sadayoshi Ito(Tohoku Univ.)
Dr. Sadayoshi Ito
(Tohoku Univ.)
Prof. Hirotsugu Takizawa(Tohoku Univ.)
Prof. Hirotsugu Takizawa
(Tohoku Univ.)
Day1 : Sept. 23, Sat
Day2 : Sept. 24, Sun
Day3 : Sept. 25, Mon
Poster Session
 

Program

9:30-9:40 Opening Remarks
Prof. Masashi SAHASHI ImPACT Program Manager (Tohoku University)
9:40-10:10 Welcome Notes
Dr. Yuko Harayama CSTI, Cabinet Office, Government of Japan
Dr. Michiharu Nakamura Counselor to President of JST (Former President)
Prof. Susumu Satomi President, Tohoku University
Keynote Speech Ⅰ【New Technology Trend】
Chair: Dr. Morihiro KURUSHIMA, JST
10:10-10:50 Future Mobility Innovation by Vehicle Electrification and Intelligence
Dr. Kazuhiro Doi NISSAN MOTOR, Japan
Keynote Speech Ⅱ【Recent Advances in MRAM Technologies】
Chair: Prof. Masashi SAHASHI, PM
10:50-11:30 Spintronics Nanodevices for Low-power Integrated Circuits
Prof. Hideo Ohno Tohoku University, Japan
11:30-12:10 Materials and Processes for Voltage-Torque MRAM
Dr. Shinji Yuasa AIST, Japan
12:10-12:50 Electric-field controlled nucleation of magnetic skyrmions at room aaa
temperature
Dr. Hélène Béa SPINTEC, France
Luncheon Seminar 【Technical Issue to be overcome and the challenges on the MRAM exit strategy】
Chair: Dr. Morihiro KURUSHIMA, JST
 (Only particular people can attend this luncheon seminar)
13:00-13:40 Near-future MRAM applications: Emerging big market can be created?
Dr. Shinobu Fujita Toshiba, Japan
Keynote Speech Ⅲ【New technology trends】
Chair: Dr. Shinobu FUJITA, Toshiba
14:45-15:25 An Implementation of Ultra-Low-Standby Power SRAMs using 65 nm
Silicon-on-Thin-Box (SOTB) for Smart IoT
Dr. Koji Nii Renesas Electronics, Japan
15:25-16:05 Non-Volatile Memory Technologies for Present and Future Applications
Dr. Kazunari Ishimaru Toshiba Memory, Japan
16:05-16:25 Coffee Break
Keynote Speech Ⅳ【New technology trends】
Chair: Prof. Tetsuo ENDOH, Tohoku Univ.
16:25-17:05 CMOS-embedded STT-MRAM Technology in 2x nm Nodes for GP-MCU
Dr. Danny P. Shum Globalfoundries, Singapore
17:05-17:45 Challenges in Resistive Memory Enabled Circuits and Systems: Memory, Nonvolatile Logics and AI Chips
Prof. Meng-Fan Chang National Tsing Hua University, Taiwan
17:45-20:00 Discussion and Poster Session with Welcome Reception
20:00 Closing (Day1)

Prof. Masashi SAHASHI

Dr. Yuko Harayama(CSTI)

Welcome Notes Dr. Yuko Harayama (CSTI)

Dr. Michiharu Nakamura(JST)

Welcome Notes Dr. Michiharu Nakamura (JST)

Prof. Susumu Satomi

Welcome Notes Prof. Susumu Satomi (Tohoku Univ.)

In the Program Session

In the Program Session

 

Program

Invited Talk Ⅰ【R&D Topics in ImPACT and the related Studies】
Chair: Dr. Shinji YUASA, AIST
9:00-9:40 Integrated technologies for CMOS/MTJ hybrid nonvolatile micro-controller unit (MCU) - From IC design tool & IP library to process technologies -
Prof. Tetsuo Endoh Tohoku University, Japan
9:40-10:20 Spin-orbit torque switching for high-speed nonvolatile memory applications
Prof. Shunsuke Fukami Tohoku University, Japan
10:20-11:00 VOLTAGE-CONTROL SPINTRONICS MEMORIES HAVING A POTENTIAL OF ULTRA-LOW ENERGY CONSUMPTION AS HIGH-DENSITY AND HIGH-SPEED WORKING MEMORIES
Dr. Hiroaki Yoda Toshiba, Japan
11:00-11:40 Voltage controlled magnetic anisotropy through magnetic dipole term induction
Prof. Shinji Miwa Osaka University, Japan
11:40-12:20 New spintronic materials for magnetic tunnel junctions
Dr. Kazuhiro Hono NIMS, Japan
Luncheon Seminar【Readied STT-MRAM Manufacturing】
Chair: Prof. Shoji IKEDA, Tohoku Univ.
  (Only particular people can attend this luncheon seminar)
12:30-13:10 STT-MRAM: ON THE CUSP OF MASS PRODUCTION
Dr. Yiming Huai Avalanche Technology, USA
13:10-13:50 Perpendicular STT-MRAM as an Emerging Embedded Non-volatile Memory with Data Retention through Solder Reflow Processing
Dr. William J. Gallagher TSMC, Taiwan
Keynote Speech Ⅴ【New technology trends】
Chair: Prof. Masashi SAHASHI, PM
15:00-15:40 Phase Change Memory with Topological Functionalities
Dr. Junji Tominaga AIST, Japan
15:40-16:20 Applications of Emerging Nonvolatile Memory in Future Intelligent Storage and Computing
Prof. Yiran Chen Duke University, USA
Invited Talk Ⅱ【R&D Topics in ImPACT and the related Studies】
Chair: Dr. Hiroaki YODA, Toshiba
16:20-17:00 Fast, low-current spin-orbit switching of magnetic tunnel junctions using Hf interface engineering
Dr. Yongxi Ou Cornell University, USA
17:00-17:40 Unconventional spin-orbit torques and their applications
Prof. Hyunsoo Yang National University of Singapore, Singapore
17:40-18:20 Electric Field and Strain Control of Magnetism: Towards Ultralow Energy Memory Devices
Prof. Nicholas G. Kioussis California State University Northridge, USA
18:20 Closing (Day2)

Prof. Masashi SAHASHI

Prof. Hideo Ohno(Tohoku Univ.)

Prof. Hideo Ohno(Tohoku Univ.)

Dr. Shinji Yuasa(AIST)

Dr. Shinji Yuasa(AIST)

In the Program Session

In the Program Session

 

Program

Greetings
Chair: Dr. Morihiro KURUSHIMA, JST
9:00-9:15 Dr. Tomio Suzuki Cabinet Office, Government of Japan
9:15-9:30 Mr. Atsuo Hirai Ministry of Economy, Trade and Industry
9:30-9:45 Prof. Hirotsugu Takizawa Tohoku University, Japan
Invited Talk Ⅲ【R&D Topics in ImPACT and the related Studies】
Chair: Prof. Shunsuke FUKAMI, Tohoku Univ.
9:45-10:25 Spintronics: A Potential Pathway to Enable an Exponential Scaling for the Beyond-CMOS Era
Prof. Jian-Ping Wang Minnesota University, USA
10:25-11:05 Roadmap of low dissipation spintronics technology
Prof. Kang L. Wang UCLA, USA
Keynote Speech Ⅵ【New technology trends】
Chair: Prof. Masashi SAHASHI, PM
11:05-11:45 Project for Development of Next-Generation Smart Devices
- Development of over 1,000 GOPS/W Image Recognition Processor Platform Technologies -
Dr. Masahiro Nomura Renesas Electronics, Japan
Luncheon Seminar【Readied STT-MRAM Manufacturing】
Chair: Dr. Shinji YUASA, AIST
 (Only particular people can attend this luncheon seminar)
12:00-12:40 Advanced Manufacturing Technologies for STT-MRAM
Dr. Hiroki Maehara Tokyo Electron, Japan
Keynote Speech Ⅶ【New technology trends】
Chair: Prof. Masashi SAHASHI, PM
13:30-14:10 Neuromorphic device for Cognitive Computing
Dr. Shintaro Yamamichi IBM, Japan
14:10-14:50 Towards a new computing paradigm
Dr. Yasunori Kimura Fujitsu, Japan
14:50-15:30 Social Value Creation Accelerated by Heterogeneous Computing and Spintronics
Dr.Yuichi Nakamura NEC, Japan
15:40 2016year Best Poster Award Ceremony and Closing Remarks, “See you next year in Tokyo” (Day 3)

Greeting Dr. Tomio Suzuki(Cabinet Office)

Greeting Dr. Tomio Suzuki(Cabinet Office)

Greeting Mr. Atsuo Hirai(MEXT)

Greeting Mr. Atsuo Hirai(METI)

Greeting Prof. Hirotsugu Takizawa(Tohoku Univ.)

Greeting Prof. Hirotsugu Takizawa(Tohoku Univ.)

In the Program Session

In the Program Session

 

Discussion and Poster Session

01 Outline of ImPACT Sahashi Program
Masashi Sahashi (Program Manager, Tohoku Univ.)
02 Spintronic Integrated Circuit Project
H. Ohno, T. Endoh, T. Hanyu, S. Ikeda (Tohoku Univ.)
03 Scheme of ImPACT Voltage-Torque MRAM Project
S. Yuasa(AIST)
04 Simulation Support Team
H. Imamura1, M. Shirai2, T. Oda3, K. Nakamura4, Y. Miura5 (1AIST, 2Tohoku Univ, 3Kanazawa Univ, 4Mie Univ, 5KIT)
05 Effect of CoFeB composition on magnetic and free-layer properties of MgO/(Co)FeB/MgO structure
M. Bersweiler, H. Sato, H. Ohno (Tohoku Univ.)
06 Quantifying Dzyaloshinskii-Moriya interaction from thermally-activated and flow regime domain wall dynamics
S. DuttaGupta, C. Zhang, S. Fukami, H. Ohno (Tohoku Univ.)
07 Coercivity dependent on magnetic-field-angle in a nanoscale CoFeB-MgO magnetic tunnel junction with perpendicular easy axis
J. Igarashi, J. Llandro, H. Sato, H Ohno (Tohoku Univ.)
08 Spin-orbit torque driven magnetization reversal in Co/Pt multilayer
B. Jinnai, C. Zhang, A. Kurenkov, M. Bersweiler, H. Sato, S. Fukami, H. Ohno (Tohoku Univ.)
09 Spin-orbit torque-induced magnetization reversal in nanoscale W/CoFeB/MgO prepared with various tungsten sputtering conditions
C. Zhang, S. Fukami, K. Watanabe, A. Ohkawara, S. DuttaGupta, H. Sato, F. Matsukura, H. Ohno (Tohoku Univ.)
10 Energy-Efficient Data-Access Technique for an Ultra Low-Power Nonvolatile Microcontroller Unit
M. Natsui, T. Hanyu (Tohoku Univ.)
11 Design of a Multi-Functional MTJ-Based FPGA for an Ultra-Low-Power Microcontroller Unit
D. Suzuki, T. Hanyu (Tohoku Univ.)
12 Development of integrated circuit and 300 mm integrated process for spintronic integrated circuit
T. Endoh, S. Ikeda, H. Koike, Y. Noguchi, H. Ohno (Tohoku Univ.)
13 Cr doping effect on interfacial magnetic anisotropy and voltage-controlled magnetic anisotropy at the Fe/MgO interface
T. Nozaki1, A. Kozioł-Rachwał1,2, S. Tamaru1, H. Kubota1, A. Fukushima1, Y. Suzuki1,3, S. Yuasa1 (1AIST, 2AGH Univ., 3Osaka Univ)
14 Effects of pulse shape on voltage-controlled magnetization switching
T. Yamamoto1, Y. Shiota1, T. Nozaki1, T. Ikeura1,2, S. Tamaru1, K. Yakushiji1, H. Kubota1, A. Fukushima1, Y. Suzuki1,3, S. Yuasa1 (1AIST, 2Tsukuba Univ., 3Osaka Univ.)
15 Fabrication of a fully epitaxial magnetic tunnel junction on an 8 inch Si wafer
A. Sugihara, K. Yakushiji, S. Yuasa (AIST)
16 Three-dimensional Integration of Perpendicular-type Magnetic Tunnel Junctions for STT-MRAM Application
K. Yakushiji, H. Takagi, N. Watanabe, A. Fukushima, K. Kikuchi, Y. Kurashima, A. Sugihara, H. Kubota, S. Yuasa (AIST)
17 Fabrication of Magnetic Tunnel Junctions with below 20nm diameter
A. Fukushima, A. Sugihara, K. Yakushiji, H. Kubota, S. Yuasa (AIST)
18 Toward giant tunnel magnetoresistance in (001) epitaxial magnetic tunnel junctions using spinel oxides
M. Belmoubarik, H. Sukegawa, T. Scheike, T. Ohkubo, S. Mitani, K. Hono (NIMS)
19 Development of magnetic tunnel junctions with chalcopyrite-type compound semiconductor barriers
K. Mukaiyama, S. Kasai, J. Wang, Y. K. Takahashi, S. Mitani, K. Hono (NIMS)
20 Low-temperature measurements of voltage-controlled magnetic anisotropy in Cr/Fe/MgAl2O4
M. Al-Mahdawi, Q. Xiang, M. Belmoubarik, H. Sukegawa, S. Kasai, S. Mitani, K. Hono (NIMS)
21 Effect of material selection on bonding interface for direct wafer bonding processing of epitaxial magnetoresistive devices
J. Chen1,2, Y. Sakuraba2 , K. Yakushiji3, H. Takagi3, Y. Kurashima3, N. Watanabe3, K. Kikuchi3, S. Yuasa3, K. Hono1,2 (1Univ. of Tsukuba, 2NIMS, 3AIST)
22 Voltage control of perpendicular magnetic anisotropy in Fe/MgAl2O4 heterostructures: significant effect of the Fe atomic layer numbers
Q. Xiang1,2, H. Sukegawa1, M. Al-Mahdawi1, M. Belmoubarik1, S. Kasai1, Y. Sakuraba1, S. Mitani1,2, K. Hono1,2 (1NIMS, 2Univ. of Tsukuba)
23 Perpendicular magnetic tunnel junctions using ultra-thin Mn-based electrodes
K. Z. Suzuki1, R. Ranjbar1, L. Bainsla1, A. Ono1, Y. Sasaki1,3, Y. Miura2, S. Mizukami1 (1WPI-AIMR, 2KIT, 3Tohoku Univ.)
24 In-plane current-induced switching in Mn-based storage layer for perpendicular magnetic tunnel
M. Takikawa1,2, K. Z. Suzuki1, R. Ranjbar1, S. Mizukami1 (1WPI-AIMR, 2Tohoku Univ.)
25 Electric field effect on magnetic anisotropy at Fe1-xCoxPd/MgO interface
A. K. Shukla1, M. Goto1,2, K. Nawaoka1, J. Suwardy1, S. Miwa1,2, Y. Suzuki1,2 (1Osaka Univ., 2CSRN Osaka Univ.)
26 Microscopic origin of voltage-controlled magnetic anisotropy in ferromagnetic thin-film metals
S. Miwa1,6, M. Suzuki2, M. Tsujikawa3,7, T. Nozaki4, T. Tsukahara1, T. Kawabe1, K. Yoshikawa1, K. Nawaoka1, M. Goto1,6, Y. Kotani2, K. Toyoki2, T. Nakamura2, T. Ohkubo5, K. Hono5, M. Shirai3,7, S. Yuasa4, Y. Suzuki1,6 (1Osaka Univ., 2JASRI, 3Tohoku Univ., 4AIST, 5NIMS, 6CSRN Osaka Univ., 7CSRN Tohoku Univ.)
27 EXAFS analysis of an Fe/Pt/MgO junction to study the voltage-induced effects in the interfacial atomic structure
M. Suzuki1, T. Tsukahara2, R. Miyakaze2, T. Furuta2, K. Shimose2, M. Goto2,3, T. Nozaki4, S. Yuasa4, Y. Suzuki2,3,4, S. Miwa2,3 (1JASRI, 2Osaka Univ., 3CSRN Osaka Univ., 4AIST)
28 Voltage-Control Spintronics Memory (VoCSM); memory with low energy consumption in high-speed writing
Y. Ohsawa1, H. Yoda1, N. Shimomura1, M. Shimizu1, S. Shirotori1, B. Altansargai1, H. Sugiyama1, K. Koi1, Y.Kato1, T. Inokuchi1, Y. Saito1, S. Oikawa1, M. Ishikawa1, T. Ajay1, T. Sasaki2, T. Ohkubo2, K. Hono2, A. Kurobe1 (1Toshiba, 2NIMS)
29 Switching Mechanism Design for High-speed Voltage-Control Spintronics Memory (VoCSM) Considering the Operation Window
K. Koi, H. Yoda, N. Shimomura, T. Inokuchi, Y. Kato, B. Altansarga¬i , S. Shirotori, Y. Kamiguchi, K. Ikegami, S. Oikawa, H. Sugiyama, M. Shimizu, M. Ishikawa, T. Ajay, Y. Ohsawa, Y. Saito, A. Kurobe (Toshiba)
30 Voltage-controlled magnetic tunnel junction based MRAM for replacing high density DRAM circuits corresponding to 2X nm generation
K. Ikegami1, Y. Shiota2, T. Nozaki2, S. Fujita1, S. Yuasa2, Y. Suzuki2,3 (1Toshiba, 2AIST, 3Osaka Univ.)
31 A 6.75F2/bit Voltage-Control Spintronics Memory Array by Two Memory Layers Stacking and Buried-Wordline Cell Transistors
S. Takaya, K. Ikegami, S. Fujita, N. Shimomura, H. Yoda (Toshiba)
32 Deterministic magnetization switching by voltage controlled Dzyaloshinskii-Moriya interaction
H. Imamura, T. Nozaki, S. Yuasa, Y. Suzuki (AIST)
33 Huge voltage-induced magnetic anisotropy change in the 5d-transtion metal monolayer on the Fe and Co surface
M. Tsujikawa1,2, M. Shirai1,2 (1REIC, 2CSRN Tohoku Univ.)
34 Sign change in the voltage-control magnetic anisotropy in terms of interface electronic structure; thickness and strain effects
T. Oda, T. Kanagawa, I. Pardede, N. Ikhsan, M. Obata (Kanazawa Univ.)
35 Material design of Fe/MgO interfaces for electric-field-modification of magnetocrystalline anisotropy
T. Nomura, K. Nakamura (Mie Univ.)
36 A first-principles study on voltage dependence of interfacial magnetic properties of Fe layer
Y. Miura1,2 (1KIT, 2NIMS)

Dr. Sadayoshi Ito(Tohoku Univ.)

Dr. Sadayoshi Ito(Tohoku Univ.)

Prof. Hirotsugu Takizawa(Tohoku Univ.)

Prof. Hirotsugu Takizawa(Tohoku Univ.)

In the Poster Session

Participants

Total Number:170
(Japan:156, US:8, France:1, Taiwan:3, Singapore:2)

List of Participating Companies/Organizations:
(More than 25 Companies/Organizations: Advantest, Intel, KEYSIGHT TECHNOLOGIES, Kyoto University, Samsung, SUMCO, Socionext, Sony, Tanaka Kikinzoku Kogyo, TDK, TEL, Tokyo Institute of Technology, The University of Tokyo,Tohoku University, Toshiba, Denso, NISSIN ION EQUIPMENT, Nissan Chemical Industries, HITACHI, FURUYA METAL, Hokkaido University, Renesas Electronics, JST, Avalanche Technology, TSMC)

Participants

Organized by [ImPACT] SAHASHI program, Japan Science and Technology Agency

Copyright © 2017 Japan Science and Technology Agency. All Rights Reserved.

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